Published April 7, 1986
| Version v1
Journal article
Photoluminescence efficiency recovery due to enhanced annealing of radiation defect in p-type InP by photogenerated carrier recombination
Creators
- 1. NTT Electrical Communications Laboratories, Tokai, Ibaraki 319-11, Japan
Description
Photoluminescence efficiency recovery in 1-MeV electron irradiated InP due to photon excitation is demonstrated. Photoluminescence intensity recovers with incident excitation power in an exponential-like manner and its recovery rate increases when temperature rises. These phenomena are explained via the recovery of the minority carrier diffusion length which is degraded through recombination center introduction by electron irradiation. Temperature dependence of recovery rate is quite similar to that of annealing rate of a dominant hole trap named H4 and recombination enhanced annealing of this defect is responsible for photoluminescence recovery
Additional details
Publishing Information
- Journal Title
- Appl. Phys. Lett.
- Journal Volume
- 48
- Journal Issue
- 14
- Series
- Appl. Phys. Lett.
- Journal Page Range
- 913-915
- ISSN
- 0003-6951
- CODEN
- APPLA
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 17050135
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ANNEALING; CARRIER DENSITY; CRYSTAL DEFECTS; DIFFUSION LENGTH; EFFICIENCY; ELECTRON COLLISIONS; HOLES; INDIUM PHOSPHIDES; MEV RANGE 01-10; PHOTOLUMINESCENCE; PHYSICAL RADIATION EFFECTS; RECOMBINATION; TRAPS
- Descriptors DEC
- COLLISIONS; CRYSTAL STRUCTURE; EMISSION; ENERGY RANGE; HEAT TREATMENTS; INDIUM COMPOUNDS; LUMINESCENCE; MEV RANGE; PHOSPHIDES; PHOSPHORUS COMPOUNDS; PHOTON EMISSION; RADIATION EFFECTS