High-resolution transmission electron microscopy investigation of nanostructures in SnO2 thin films prepared by pulsed laser deposition
Creators
- 1. Department of Physics and Materials Science, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon Tong, Hong Kong (China)
Description
Pulsed laser deposition (PLD) was used to grow nanocrystalline SnO2 thin films onto glass substrates. The nanocrystallites and microstructures in SnO2 thin films grown by PLD techniques have been investigated in detail by using X-ray diffraction and high-resolution transmission electron microscopy (HRTEM). The PLD process was carried out at room temperature under a working pressure of about 2x10-6mbar. Experimental results indicate that thin films are composed of a polycrystalline SnO2 and an amorphous SnO phase. In particular, the presence of such an amorphous SnO phase in the thin films greatly limits their practical use as gas-sensing devices. HRTEM observations revealed that SnO2 nanocrystallites with tetragonal rutile structure embed in an amorphous SnO matrix, which are approximatively equiaxed. These approximatively equiaxed SnO2 nanocrystallites contain a high density of defects, such as twin boundaries and edge dislocations. The grain growth of SnO2 thin films may be discussed in terms of the coalescent particle growth mechanism
Additional details
Identifiers
- DOI
- 10.1016/j.jssc.2005.01.013;
- PII
- S0022-4596(05)00024-1;
Publishing Information
- Journal Title
- Journal of Solid State Chemistry
- Journal Volume
- 178
- Journal Issue
- 3
- Journal Page Range
- p. 892-896
- ISSN
- 0022-4596
- CODEN
- JSSCBI
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37037294
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Descriptors DEI
- EDGE DISLOCATIONS; ENERGY BEAM DEPOSITION; GRAIN GROWTH; LASER RADIATION; MICROSTRUCTURE; NANOSTRUCTURES; POLYCRYSTALS; PULSED IRRADIATION; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; TIN OXIDES; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION
- Descriptors DEC
- CHALCOGENIDES; COHERENT SCATTERING; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; CRYSTALS; DEPOSITION; DIFFRACTION; DISLOCATIONS; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; FILMS; IRRADIATION; LINE DEFECTS; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; RADIATIONS; SCATTERING; SURFACE COATING; TEMPERATURE RANGE; TIN COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.