Published 1998
| Version v1
Miscellaneous
Open
The pin-hole micro-Laue patterns of implanted layers
Creators
- 1. Institute of Atomic Energy, Otwock-Swierk (Poland)
- 2. Institute of Electronic Materials Technology, Warsaw (Poland)
- 3. HASYLAB at DESY, Hamburg (Germany)
Description
no abstract available
Files
30030576.pdf
Files
(77.5 kB)
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Additional details
Publishing Information
- Imprint Place
- Otwock-Swierk (Poland)
- Imprint Title
- Annual Report 1997
- Imprint Pagination
- 161 p.
- Journal Page Range
- p. 47-48
- Report number
- INIS-PL--99003
INIS
- Country of Publication
- Poland
- Country of Input or Organization
- Poland
- INIS RN
- 30030576
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Progress Report, No Abstract
- Descriptors DEI
- CRYSTAL DEFECTS; CRYSTAL STRUCTURE; ION IMPLANTATION; LAUE METHOD; LAYERS; PROGRESS REPORT; SYNCHROTRON RADIATION
- Descriptors DEC
- BREMSSTRAHLUNG; CRYSTAL STRUCTURE; DIFFRACTION METHODS; DOCUMENT TYPES; ELECTROMAGNETIC RADIATION; RADIATIONS
Optional Information
- Contract/Grant/Project number
- Grant No. POL-GER-N-100-95/BO(204/P-3)
- Notes
- 2 refs, 3 figs
- Funding organization
- Polish-German Cooperation (International Organisation without Location)