Published August 16, 1991 | Version v1
Patent

Decontamination method for radioactive metal waste

Description

As a method for certainly removing contamination at the inside of metal substrates, a blast decontamination method for scraping metals and an electrolytic removing method for dissolving metals are promising. However, each of them has drawbacks and the dissolution has been desired. In the present invention, it is noted that the scraping speed or the dissolving speed of the metal substrate is higher than that of oxide films in the blast decontamination method and the electrolytic decontamination method. That is, in a decontamination method for radioactive metal wastes in which decontamination diffuses and penetrates or activation proceeds as far as the inside of the metal substrate, the metal wastes are at first stored under an oxide film forming promoting circumstance to grow the oxide film layer. Thereafter the oxide layer is removed. This can remarkably shorten the time for decontamination for radioactive metal wastes. (T.M.)

Availability note (English)

Available from JAPIO. Also available from INPADOC.

Additional details

Publishing Information

Imprint Pagination
6 p.
IPC:
Int. Cl. G21F9/28; G21F9/30.
IPC
Int. Cl. G21F9/28; G21F9/30.
Patent number
JP patent document 3-188398/A/

Optional Information

Secondary number(s)
JP patent application 1-329201.