Influence factors on etching rate of PET nuclear pore membrane
Creators
- 1. Department of Nuclear Physics, China Institute of Atomic Energy, Beijing (China)
- 2. University of South Chian, Hengyang (China)
Description
Background: The nuclear pore membrane is a kind of liquid filtration material manufactured by irradiation and chemical etching. Various conditions in etch process have a great influence on etch rate. Purpose: The influence factors of concentration and temperature of etch solution and the irradiation energy of heavy ions on etch rate was studied. Methods: Four layers of PET (polyethylene terephthalate) films were stacked together and were irradiated with 140-MeV 32S ions at room temperature under vacuum conditions. Utilizing conductivity measurement technique, the electrical current changes through the u:radiated PET film were monitored during etching, from which the breakthrough time and therefore the track etching rate was calculated. Results: The results show that there is an exponential correlation between etch rate and temperature, and a linear correlation between etch rate and concentration. The track etching rate increases linearly with energy loss rate. Empirical formula for the bulk etching rate as a function of etchant concentration and temperature was also established via fitting of measurements. Conclusion: It is concluded that by using 1.6-MeV·u-1 32S ions, PET nuclear pore membrane with cylindrical pore shape can be prepared at 85℃ with etchant concentration of l mol·L-1. (authors)
Additional details
Publishing Information
- Journal Title
- Nuclear Techniques
- Journal Volume
- 37
- Journal Issue
- 4
- Journal Page Range
- [6 p.]
- ISSN
- 0253-3219
INIS
- Country of Publication
- China
- Country of Input or Organization
- China
- INIS RN
- 47072020
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S43: PARTICLE ACCELERATORS;
- Descriptors DEI
- CONCENTRATION RATIO; CORRELATIONS; CYLINDRICAL CONFIGURATION; ELECTRIC CURRENTS; ENERGY LOSSES; ETCHING; FILMS; FILTRATION; HEAVY IONS; IRRADIATION; MEMBRANES; MEV RANGE 100-1000; MONITORS; PARTICLE TRACKS; POLYESTERS; SOLUTIONS; SULFUR 32; TEMPERATURE RANGE 0273-0400 K
- Descriptors DEC
- CHARGED PARTICLES; CONFIGURATION; CURRENTS; DIMENSIONLESS NUMBERS; DISPERSIONS; ENERGY RANGE; ESTERS; EVEN-EVEN NUCLEI; HOMOGENEOUS MIXTURES; IONS; ISOTOPES; LIGHT NUCLEI; LOSSES; MEASURING INSTRUMENTS; MEV RANGE; MIXTURES; NUCLEI; ORGANIC COMPOUNDS; ORGANIC POLYMERS; POLYMERS; SEPARATION PROCESSES; STABLE ISOTOPES; SULFUR ISOTOPES; SURFACE FINISHING; TEMPERATURE RANGE
Optional Information
- Notes
- 9 figs., 1 tab., 7 refs. 040203-1-040203-6