Critical currents and scaling laws in sputtered PbMo/sub 6plus-or-minusx/ S/sub 8-y/ thin films

Thin films with the Chevrel-phase structure were deposited using a dc getter sputtering method from targets with composition PbMo/sub 5.1/S6 and PbMo/sub 6.35/S8, respectively. Critical parameters as T/sub c/, [dB/dT]/sub T//sub c/, and J/sub c/ vs. B and T wee measured. Based on the J/sub c/(B,T) relation it was possible to show that the pinning forces P/sub v/ with respect to the reduced magnetic field b = B/B/sub c/2 have the form b/sup 1/2/(1-b)2 for samples prepared from the target with the composition PbMo/sub 5.1/S6 and b(1-b)2 for samples prepared from the target with the composition PbMo/sub 6.35/S8. It is suggested that some of MoS2 phase is responsible for pinning centers in the first set of samples This MoS2 phase was indicated by x-ray diffraction. For the second set of samples it is supposed that point-type defects are the pinning centers