Plasma processing of thin films of high temperature superconductors: deposition methods and growth aspects

Remarkable advances have been in recent years in science and technology of thin film processes for deposition of high temperature superconductors. In this report, various deposition techniques have been reviewed from a process view point. Fundamental aspects of DC glow discharges and sputtering techniques based on plasma process are outlined. Emphasis is placed on the plasma assisted technique such as glow discharge deposition. The issues relating to the formation of superconducting thin films of YBa2Cu3O7x on variety of single crystal substrates are also briefly described. (author)