Published March 1, 2020 | Version v1
Journal article

Studies on the stress and thermal properties of Mo/B4C and MoxC1-x/B4C multilayers

  • 1. MOE Key Laboratory of Advanced Micro-structured Materials, School of Physics Science and Engineering, Tongji University, Shanghai 200092 (China)
  • 2. Shanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute, Chinese Academy of Sciences, Zhangheng Road 239, Pudong District, Shanghai 201204 (China)

Description

A comparative study of Mo/B4C and MoxC1-x/B4C multilayers deposited by DC magnetron sputtering technology was presented in this paper. Using a homemade real-time stress measure instrument, the stress of two kinds of multilayers was investigated. Characterizations of the multilayers before and after annealing were performed by grazing incident and at-wavelength near-normal incident x-ray reflectivity. Experimental results show that after replacing Mo by MoxC1-x, MoxC1-x/B4C multilayers obtain relatively smaller compressive stress compared with Mo/B4C multilayers. The corresponding stress value changes from −0.99 GPa to −0.36 Gpa. MoxC1-x/B4C multilayers have also proven to have better thermal stability up to 600 °C. After repeatedly annealing from 100 °C to 600 °C, Mo/B4C multilayers had a ∼2% decrease in near-normal incident reflectivity, while MoxC1-x/B4C multilayers had a smaller 1.4% loss of reflectivity and a higher stability temperature. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/2053-1591/ab7c87

Additional details

Identifiers

Publishing Information

Journal Title
Materials Research Express (Online)
Journal Volume
7
Journal Issue
3
Journal Page Range
[8 p.]
ISSN
2053-1591