Characterization of microwave plasma generated in inhomogeneous magnetic field

The electron cyclotron resonance (ECR) argon discharge in a decreasing magnetic field was investigated using thin and thick electric probes. The pressure was varied between 0.9 and 90 Pa, and the absorbed microwave power from 50 to 400 W. The influence of the substrate holder on plasma microparameters was studied. The experiments showed that measurements with a thin probe do not give correct results in the presence of the substrate holder. The position of the substrate holder proved to be crucial for achieving a good reproducibility of thin film processing. The ECR absorption dominates at pressures below 1 Pa, while at pressures above 90 Pa mainly collisional absorption contributes to plasma generation. (J.U.) 5 figs., 9 refs