Published November 21, 2007 | Version v1
Journal article

Structural characterization by electronic transport properties on Fe3Si films

  • 1. Department of Applied Physics and Chemistry, University of Electro-Communications, Chofugaoka 1-5-1, Chofu-shi, Tokyo 182-8585 (Japan)
  • 2. Kanagawa Industrial Technology Center, Ebina, Kanagawa 243-0435 (Japan)
  • 3. Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, Yokohama 226-8502 (Japan)

Description

We have investigated the electronic transport properties of resistivity, magnetoresistance and the Hall effect on epitaxial and polycrystalline Fe3Si thin films. The electrical transport measurements reveal the microstructure which has not been clarified from x-ray diffraction and/or scanning electron microscopy. We show that (1 0 0)-oriented epitaxial film 36 nm thick on MgO(1 1 1) exhibits ferromagnetic-tunnelling conduction (1 1 0)-oriented epitaxial film 36 nm thick on yttria stabilized zirconia [YSZ(1 1 1)] is in a percolated region, and polycrystalline film 36 nm thick on Al2O3(1 1 0) and (1 0 0)-oriented epitaxial film 150 nm thick on MgAl2O4(1 0 0) have metallic conduction. These results imply that the electrical transport measurements are a powerful tool for evaluating the microstructure of the samples. The coefficients of the skew and the side-jump scatterings in the extraordinary Hall effect, and the quadratic temperature coefficient of resistivity observed on (1 0 0)-oriented epitaxial film 150 nm thick on MgAl2O4 show that Fe3Si is a ferromagnetic metal where the effective electron mass is slightly enhanced compared with Fe, Co and Ni due to the electron-electron correlation

Additional details

Identifiers

DOI
10.1088/0022-3727/40/22/003;
PII
S0022-3727(07)57174-3;

Publishing Information

Journal Title
Journal of Physics. D, Applied Physics
Journal Volume
40
Journal Issue
22
Journal Page Range
p. 6873-6878
ISSN
0022-3727
CODEN
JPAPBE