Published August 2018 | Version v1
Journal article

Toxic gases molecules (NH3, SO2 and NO2) adsorption on GeSe monolayer with point defects engineering

  • 1. Hunan Key Laboratory for Micro–Nano Energy Materials and Devices, School of Physics and Optoelectronic, Xiangtan University, Hunan 411105 (China)
  • 2. Hunan Key Laboratory for Computation and Simulation in Science and Engineering, School of Mathematics and Computational Science, Xiangtan University, Hunan 411105 (China)
  • 3. Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, Chongqing 401120 (China)

Description

Highlights: • The adsorption of the gas molecules on point defects in GeSe monolayer introduces new state around the Fermi level. • The GeSe monolayer with point defects engineering has potential application in gas sensing. • The work function of GeSe monolayer with defect engineering is highly sensitive to gas molecules. First-principles calculations are performed to study the structure, stability, density of states and work function of toxic gases (NH3, SO2 and NO2) molecules adsorption on GeSe monolayer with point defect engineering, including Ge/Se mono-vacancy, anti-site defect, and P atom substituted defect. Our results on the adsorption energy, charge transfer and electron localization function show that the interaction between gas molecules and point defects in GeSe monolayer is sensitive, which causes significant modification to the electronic structure and work functions of GeSe monolayer.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.cplett.2018.06.061

Additional details

Identifiers

DOI
10.1016/j.cplett.2018.06.061;
PII
S0009261418305396;

Publishing Information

Journal Title
Chemical Physics Letters
Journal Volume
706
Journal Page Range
p. 501-508
ISSN
0009-2614
CODEN
CHPLBC

Optional Information

Copyright
Copyright (c) 2018 Elsevier B.V. All rights reserved.