Surface modification of poly(dimethylsiloxane) for controlling biological cells' adhesion using a scanning radical microjet
- 1. Department of Materials Engineering, School of Engineering, University of Tokyo, 2-11-16 Yayoi, Bunkyo-ku, 113-8656 (Japan)
- 2. Department of Electrical and Electronics Engineering, Toyo University, 2100 Kujirai, Kawagoe, 350-8585 (Japan)
- 3. Center for NanoBio Integration, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, 113-8656 (Japan)
- 4. Department of Bioengineering, School of Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, 113-8656 (Japan)
- 5. Department of Bioengineering, School of Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, 113-8656 (Japan) and Center for NanoBio Integration, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, 113-8656 (Japan)
Description
A scanning radical microjet (SRMJ) equipment using oxygen microplasma has been developed and successfully applied for controlling biological cells' attachment on biocompatible polymer material, poly(dimethylsiloxane) (PDMS). The radical microjet has advantages in localized and high-rate surface treatment. Moreover, maskless hydrophilic patterning using SRMJ has been demonstrated to be applicable to patterned cell cultivation which is useful in emerging biotechnological field such as tissue engineering and cell-based biosensors. Since control of PDMS surface properties is an indispensable prerequisite for cells' attachment, effects of oxygen flow rates and treatment time on localized hydrophilic patterning of PDMS surfaces were first investigated for controlling HeLa cells' (human epitheloid carcinoma cell line) attachment. Relationships between surface conditions of treated PDMS films and attached cell density are also discussed based on surface properties analyzed using atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS)
Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2006.10.026;
- PII
- S0040-6090(06)01163-1;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 515
- Journal Issue
- 12
- Journal Page Range
- p. 5172-5178
- ISSN
- 0040-6090
- CODEN
- THSFAP
Conference
- Title
- 3. International symposium on dry process
- Dates
- 28-30 Nov 2005
- Place
- Jeju (Korea, Republic of)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 39018759
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ADHESION; ATOMIC FORCE MICROSCOPY; BIOTECHNOLOGY; CARCINOMAS; FILMS; FLOW RATE; OXYGEN; POLYMERS; SILOXANES; SURFACE PROPERTIES; SURFACE TREATMENTS; SURFACES; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- DISEASES; ELECTRON SPECTROSCOPY; ELEMENTS; MICROSCOPY; NEOPLASMS; NONMETALS; ORGANIC COMPOUNDS; ORGANIC SILICON COMPOUNDS; PHOTOELECTRON SPECTROSCOPY; SPECTROSCOPY
Optional Information
- Copyright
- Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.