Microstructure and Mechanical Properties of Nanostructured Co-Cu Alloy Films Processed by Electrodeposition
Creators
- 1. Graduate School of Energy Science, Kyoto University, Yoshidahonmachi, Sakyo-ku, Kyoto, 606-8501 (Japan)
- 2. Cooperative Research Facility Center, Toyohashi University of Technology, 1-1 Hibarigaoka, Tempaku-cho, Toyohashi 440-8580 (Japan)
Description
Two kinds of nanostructured Co-Cu alloy films: a nanolamellar Co-Cu alloy film and an ultrafine-grained two-phase Co-Cu alloy film were processed by electrodeposition, and their microstructures and mechanical properties were investigated. These nanostructured Co-Cu alloy films showed the high hardness and the low activation volume. The mechanical properties of the nanostructured Co-Cu alloy films strongly depended on the grain boundary characteristics. Molecular dynamics simulations were performed in the two-phase Co-Cu alloy film to investigate the dislocation emission at the Co/Cu interface. The molecular dynamics simulations showed that the stacking faults, which are generated by the intense geometrical strain at the Co/Cu interface, play an important role in the dislocation emission.
Availability note (English)
Available from http://dx.doi.org/10.1088/1742-6596/417/1/012064Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Physics. Conference Series (Online)
- Journal Volume
- 417
- Journal Issue
- 1
- Journal Page Range
- [5 p.]
- ISSN
- 1742-6596
Conference
- Title
- 15. international conference on thin films
- Acronym
- ICTF-15
- Dates
- 8-11 Nov 2011
- Place
- Kyoto (Japan)
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44068251
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- COBALT ALLOYS; COPPER ALLOYS; DISLOCATIONS; ELECTRODEPOSITION; EMISSION; GRAIN BOUNDARIES; HARDNESS; INTERFACES; MOLECULAR DYNAMICS METHOD; NANOSTRUCTURES; SIMULATION; STACKING FAULTS; THIN FILMS
- Descriptors DEC
- ALLOYS; CALCULATION METHODS; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; DEPOSITION; ELECTROLYSIS; FILMS; LINE DEFECTS; LYSIS; MECHANICAL PROPERTIES; MICROSTRUCTURE; SURFACE COATING; TRANSITION ELEMENT ALLOYS