Published March 1, 2013 | Version v1
Journal article

Microstructure and Mechanical Properties of Nanostructured Co-Cu Alloy Films Processed by Electrodeposition

  • 1. Graduate School of Energy Science, Kyoto University, Yoshidahonmachi, Sakyo-ku, Kyoto, 606-8501 (Japan)
  • 2. Cooperative Research Facility Center, Toyohashi University of Technology, 1-1 Hibarigaoka, Tempaku-cho, Toyohashi 440-8580 (Japan)

Description

Two kinds of nanostructured Co-Cu alloy films: a nanolamellar Co-Cu alloy film and an ultrafine-grained two-phase Co-Cu alloy film were processed by electrodeposition, and their microstructures and mechanical properties were investigated. These nanostructured Co-Cu alloy films showed the high hardness and the low activation volume. The mechanical properties of the nanostructured Co-Cu alloy films strongly depended on the grain boundary characteristics. Molecular dynamics simulations were performed in the two-phase Co-Cu alloy film to investigate the dislocation emission at the Co/Cu interface. The molecular dynamics simulations showed that the stacking faults, which are generated by the intense geometrical strain at the Co/Cu interface, play an important role in the dislocation emission.

Availability note (English)

Available from http://dx.doi.org/10.1088/1742-6596/417/1/012064

Additional details

Publishing Information

Journal Title
Journal of Physics. Conference Series (Online)
Journal Volume
417
Journal Issue
1
Journal Page Range
[5 p.]
ISSN
1742-6596

Conference

Title
15. international conference on thin films
Acronym
ICTF-15
Dates
8-11 Nov 2011
Place
Kyoto (Japan)

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
44068251
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
COBALT ALLOYS; COPPER ALLOYS; DISLOCATIONS; ELECTRODEPOSITION; EMISSION; GRAIN BOUNDARIES; HARDNESS; INTERFACES; MOLECULAR DYNAMICS METHOD; NANOSTRUCTURES; SIMULATION; STACKING FAULTS; THIN FILMS
Descriptors DEC
ALLOYS; CALCULATION METHODS; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; DEPOSITION; ELECTROLYSIS; FILMS; LINE DEFECTS; LYSIS; MECHANICAL PROPERTIES; MICROSTRUCTURE; SURFACE COATING; TRANSITION ELEMENT ALLOYS