A simple method for producing freestanding 3D microstructures by integrated photomask micromolding

Freestanding three-dimensional (3D) microstructures are widely used in micro-electro-mechanical system (MEMS) applications or can function as microdevices themselves. However, microfabrication methods for freestanding 3D microstructures have limitations in shape, size, cost, and mass production, etc. In this work, integrated photomask micromolding is demonstrated, which uses a portable UV light source and chrome glass micromolding to fabricate 3D microstructures without alignment. Specifically, a chrome layer on one side of the glass micromold shields the excess filling SU-8 photoresist from UV exposure and only the SU-8 photoresist in mold cavities is crosslinked. The 3D microstructures produced using this method have very high dimensional accuracy and the profile error is approximately 1.5%. This method can be used with features of virtually any size and shape and can be integrated into highly-parallel micromolding processes and has potential for MEMS applications. (technical note)