Published August 14, 1990 | Version v1
Patent Metadata-only

Process for lowering residual tantalum values in niobium

Creators

Description

This paper discusses a process for removing tantalum values from niobium values. It comprises admixing a NbCl5/TaCl5 charge having a molar ratio from about 10/1 to about 10,000/1 with a 8N to 20N aqueous HCl solution at a total charge concentration of from about 50 to about 150 parts/100 parts by weight of the HCl solution to form a reaction system, and contacting at least the surface of the hydrolysis system with a gas for a period of time within which a precipitate settles out an average rate of from about 0.1 to about 6.0% by weight of the initial solids charge per hour

Availability note (English)

Patent and Trademark Office, Box 9, Washington, DC 20232 (USA).

Additional details

Publishing Information

Imprint Pagination
vp.
IPC:
Int. Cl. C01G 33/00.
IPC
Int. Cl. C01G 33/00.
Patent number
US patent document 4,948,570/A/

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
22015222
Subject category
S36: MATERIALS SCIENCE; S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
Resource subtype / Literary indicator
Non-conventional Literature
Descriptors DEI
AQUEOUS SOLUTIONS; HYDROCHLORIC ACID; HYDROLYSIS; NIOBIUM; RESIDUES; SEPARATION PROCESSES; TANTALUM
Descriptors DEC
CHEMICAL REACTIONS; CHLORINE COMPOUNDS; DECOMPOSITION; DISPERSIONS; ELEMENTS; HALOGEN COMPOUNDS; HOMOGENEOUS MIXTURES; HYDROGEN COMPOUNDS; INORGANIC ACIDS; INORGANIC COMPOUNDS; METALS; MIXTURES; SOLUTIONS; SOLVOLYSIS; TRANSITION ELEMENTS