Published June 13, 2011 | Version v1
Journal article Metadata-only

Optical field-enhancement in metal nanoparticle arrays contacted by electron beam induced deposition

Creators

  • 1. Walter Schottky Institut, Physik-Department, Technische Universitaet Muenchen, Am Coulombwall 4a, D-85748 Garching (Germany)

Description

We study the impact of optical field-enhancement effects on the optoelectronic properties of metal nanoparticle arrays. Applying a focused ion beam lithography in combination with an electron beam induced deposition technique we pattern electrical contacts in a way that they give rise to an electromagnetic field-enhancement. The field-enhancement is directly observed in an enhanced photoconductance of the arrays. Finite-difference time-domain simulations verify that an antenna effect is responsible for the observed increase in the photoconductance.

Additional details

Identifiers

DOI
10.1063/1.3599713;

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
98
Journal Issue
24
Journal Page Range
p. 243108-243108.3
ISSN
0003-6951
CODEN
APPLAB

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
42109133
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
DEPOSITION; ELECTRIC CONTACTS; ELECTROMAGNETIC FIELDS; ELECTRON BEAMS; ION BEAMS; METALS; NANOSTRUCTURES; PARTICLES; PHOTOCONDUCTIVITY; SIMULATION
Descriptors DEC
BEAMS; ELECTRIC CONDUCTIVITY; ELECTRICAL EQUIPMENT; ELECTRICAL PROPERTIES; ELEMENTS; EQUIPMENT; LEPTON BEAMS; PARTICLE BEAMS; PHYSICAL PROPERTIES

Optional Information

Notes
(c) 2011 American Institute of Physics