Published October 15, 2009 | Version v1
Journal article

Elaboration and characterization of crystalline RF-deposited V2O5 positive electrode for thin film batteries

  • 1. CEA, DTNM/LCMS, 17 rue des martyrs, 38054 Grenoble (France)
  • 2. ICMPE, UMR CNRS 7182, GESMAT, 2 rue Henri Dunant, 94320 Thiais (France)

Description

Investigations were realized on the microstructural and morphological evolution of RF-sputtered vanadium pentoxide thin films during growth. V2O5 thin films at different stages of growth were studied by spectroscopic ellipsometry, X-ray diffraction, atomic force microscopy and scanning electron microscopy. Film grain orientation, roughness and density were found to have notable evolution during growth. Electrochemical tests in liquid and solid electrolyte state configuration showed non-linear relationship between discharge capacity and V2O5 film thickness (<1 μm), which could be attributed in parts to the observed morphological and microstructural changes during growth, mainly the existence of a gradient density through film thickness and the pronounced top surface roughness.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2009.07.115

Additional details

Identifiers

DOI
10.1016/j.apsusc.2009.07.115;
PII
S0169-4332(09)01108-8;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
256
Journal Issue
1
Journal Page Range
p. 149-155
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.