Laser Resistance of Ta2O5/SiO2 and ZrO2/SiO2 Optical Coatings under 2 μm Femtosecond Pulsed Irradiation
Creators
- 1. Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800 (China)
Description
Ta2 O5/SiO2 and ZrO2/SiO2 high reflecting (HR) coatings are prepared by ion beam sputtering and electron beam evaporation, respectively. The laser-induced damage thresholds (LIDTs) of these samples are investigated with 2 μm femtosecond pulse lasers (80 fs, 1 kHz). It is found that the Ta1O5/SiO2 HR coating has a higher capability of laser damage resistance than the ZrO2/SiO2 HR coating in the 2 μm femtosecond regime. The scanning electron microscope results show that the damage sites of the ZrO2/SiO2 HR coating have a relatively porous structure, the loose structure of coatings will provide more sites for water molecules, and the LIDTs of HR coatings will be reduced as a result of the strong water absorption at the wavelength of 2μm. (fundamental areas of phenomenology (including applications))
Availability note (English)
Available from http://dx.doi.org/10.1088/0256-307X/27/7/074215Additional details
Identifiers
Publishing Information
- Journal Title
- Chinese Physics Letters
- Journal Volume
- 27
- Journal Issue
- 7
- Journal Page Range
- [4 p.]
- ISSN
- 0256-307X
- CODEN
- CPLEEU
INIS
- Country of Publication
- China
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45003014
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ABSORPTION; COATINGS; ELECTRON BEAMS; EVAPORATION; INTERFACES; KHZ RANGE; LASER RADIATION; MOLECULES; POROUS MATERIALS; PULSED IRRADIATION; RADIATION EFFECTS; SCANNING ELECTRON MICROSCOPY; SILICON OXIDES; SPUTTERING; TANTALUM OXIDES; WAVELENGTHS; ZIRCONIUM OXIDES
- Descriptors DEC
- BEAMS; CHALCOGENIDES; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; FREQUENCY RANGE; IRRADIATION; LEPTON BEAMS; MATERIALS; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; PARTICLE BEAMS; PHASE TRANSFORMATIONS; RADIATIONS; REFRACTORY METAL COMPOUNDS; SILICON COMPOUNDS; SORPTION; TANTALUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; ZIRCONIUM COMPOUNDS