Published April 28, 1981 | Version v1
Patent Metadata-only

Sputtered particle flow source for isotopically selective ionization

Creators

Description

Method and apparatus are described for sputtering particles of plural isotope types to produce a particle flow of the plural isotope types into a region where laser radiation is generated to produce isotopically selective ionization of at least one isotope type in the sputtered particle flow. Separate collection of the ionized particles is accomplished through application of a magnetic field in the region of ionization and beyond

Availability note (English)

U.S. Commissioner of Patents, Washington, D.C. 20231, USA, $.50.

Additional details

Additional titles

Augmented title (English)
Patent

Publishing Information

Imprint Pagination
v p.
Patent number
US patent document 4,264,819/A/

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
13699913
Subject category
S11: NUCLEAR FUEL CYCLE AND FUEL MATERIALS; S07: ISOTOPES AND RADIATION SOURCES;
Resource subtype / Literary indicator
Non-conventional Literature
Descriptors DEI
EXCITATION; IONIZATION; LASER ISOTOPE SEPARATION; LASER RADIATION; MAGNETIC FIELDS; SPUTTERING; URANIUM 235
Descriptors DEC
ACTINIDE NUCLEI; ALPHA DECAY RADIOISOTOPES; ELECTROMAGNETIC RADIATION; ENERGY-LEVEL TRANSITIONS; EVEN-ODD NUCLEI; HEAVY NUCLEI; ISOMERIC TRANSITION ISOTOPES; ISOTOPE SEPARATION; ISOTOPES; MINUTES LIVING RADIOISOTOPES; NUCLEI; RADIATIONS; RADIOISOTOPES; SEPARATION PROCESSES; URANIUM ISOTOPES; YEARS LIVING RADIOISOTOPES