Published February 7, 2016 | Version v1
Journal article

Energies of the X- and L-valleys in In0.53Ga0.47As from electronic structure calculations

  • 1. Tyndall National Institute, Lee Maltings, Prospect Row, Cork (Ireland)
  • 2. Department of Materials Science and Engineering, University of Texas at Dallas, 800 West Campbell Road RL10, Richardson, Texas 75080 (United States)

Description

Several theoretical electronic structure methods are applied to study the relative energies of the minima of the X- and L-conduction-band satellite valleys of InxGa1−xAs with x = 0.53. This III-V semiconductor is a contender as a replacement for silicon in high-performance n-type metal-oxide-semiconductor transistors. The energy of the low-lying valleys relative to the conduction-band edge governs the population of channel carriers as the transistor is brought into inversion, hence determining current drive and switching properties at gate voltages above threshold. The calculations indicate that the position of the L- and X-valley minima are ∼1 eV and ∼1.2 eV, respectively, higher in energy with respect to the conduction-band minimum at the Γ-point

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
119
Journal Issue
5
Journal Page Range
p. 055707-055707.6
ISSN
0021-8979
CODEN
JAPIAU

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
47065197
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Descriptors DEI
ABSORPTION SPECTROSCOPY; CARRIERS; ELECTRONIC STRUCTURE; OXIDES; PERFORMANCE; SEMICONDUCTOR MATERIALS; SILICON; TRANSISTORS; X-RAY SPECTROSCOPY
Descriptors DEC
CHALCOGENIDES; ELEMENTS; MATERIALS; OXYGEN COMPOUNDS; SEMICONDUCTOR DEVICES; SEMIMETALS; SPECTROSCOPY

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