Published 2008 | Version v1
Miscellaneous Open

Plasma enhanced germanium nitride dielectric thin films for phase change recording systems

  • 1. Institute of Electro-Optical Engineering, Department of Chemical and Materials Enginering, Chang Gung University, Kweisan (China)

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no abstract available

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Part of:
Programme and abstracts of the seventh International Conference on Ion Implantation and other Applications of Ions and Electrons (ION 2008)

Additional details

Publishing Information

Publisher
Maria Curie-Sklodowska University, Lublin
Imprint Place
Lublin (Poland)
Imprint Title
Programme and abstracts of the seventh International Conference on Ion Implantation and other Applications of Ions and Electrons (ION 2008)
Imprint Pagination
186 p.
Journal Page Range
p. 34
Report number
INIS-PL--2009-0011

Conference

Title
7. International Conference on Ion Implantation and other Applications of Ions and Electrons
Acronym
ION 2008
Dates
16-19 Jun 2008
Place
Kazimierz Dolny (Poland)

INIS

Country of Publication
Poland
Country of Input or Organization
Poland
INIS RN
40107910
Subject category
S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
No Abstract, Conference
Descriptors DEI
DIELECTRIC MATERIALS; GERMANIUM NITRIDES; ION IMPLANTATION; LAYERS; OPTICAL PROPERTIES; PLASMA ARC WELDING; THIN FILMS
Descriptors DEC
ARC WELDING; FABRICATION; FILMS; GERMANIUM COMPOUNDS; JOINING; MATERIALS; NITRIDES; NITROGEN COMPOUNDS; PHYSICAL PROPERTIES; PNICTIDES; WELDING

Optional Information