Published June 13, 2007
| Version v1
Journal article
Pulsed-laser deposition of textured cerium oxide thin films on glass substrates at room temperature
- 1. National Renewable Energy Laboratory, 1617 Cole Boulevard, Golden, Colorado 80401 (United States)
Description
Cerium oxide thin films are deposited on glass by pulsed laser deposition at room temperature and characterized by X-ray diffraction and atomic force microscopy. The effects of ambient gas, rate of deposition and fluence on growth of films have been studied. The films grown in forming gas and with a high rate of deposition are polycrystalline and show preferential orientation along <011> direction with a roughness of ∼ 2 nm. Films prepared in oxygen have low crystallinity
Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2007.01.053;
- PII
- S0040-6090(07)00118-6;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 515
- Journal Issue
- 17
- Journal Page Range
- p. 6971-6974
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 39019004
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ATOMIC FORCE MICROSCOPY; CERIUM OXIDES; CRYSTAL GROWTH; ENERGY BEAM DEPOSITION; GLASS; LASER RADIATION; OXYGEN; POLYCRYSTALS; PULSED IRRADIATION; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; X-RAY DIFFRACTION
- Descriptors DEC
- CERIUM COMPOUNDS; CHALCOGENIDES; COHERENT SCATTERING; CRYSTALS; DEPOSITION; DIFFRACTION; ELECTROMAGNETIC RADIATION; ELEMENTS; FILMS; IRRADIATION; MICROSCOPY; NONMETALS; OXIDES; OXYGEN COMPOUNDS; RADIATIONS; RARE EARTH COMPOUNDS; SCATTERING; SURFACE COATING; TEMPERATURE RANGE
Optional Information
- Copyright
- Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.