Published 2000
| Version v1
Miscellaneous
Ion sputtering of microparticles in SIMS depth profile analysis
- 1. Institute of Vacuum Technology, Warsaw (Poland)
- 2. Institute of Microsystem Technology, Wroclaw Institute of Technology, Wroclaw (Poland)
Description
no abstract available
Additional details
Publishing Information
- Imprint Title
- Abstracts of 3. International Symposium Ion Implantation and Other Applications of Ions and Electrons, ION 2000
- Imprint Pagination
- 120 p.
- Journal Page Range
- p. 50
Conference
- Title
- 3. International Symposium Ion Implantation and Other Applications of Ions and Electrons, ION 2000
- Dates
- 12-15 Jun 2000
- Place
- Kazimierz Dolny (Poland)
INIS
- Country of Publication
- Poland
- Country of Input or Organization
- Poland
- INIS RN
- 32030012
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- No Abstract, Conference, Non-conventional Literature
- Descriptors DEI
- DEPTH; ION BEAMS; MASS SPECTROSCOPY; OXYGEN IONS; SECONDARY BEAMS; SPATIAL DISTRIBUTION; SPUTTERING
- Descriptors DEC
- BEAMS; CHARGED PARTICLES; DIMENSIONS; DISTRIBUTION; IONS; SPECTROSCOPY
Optional Information
- Notes
- 4 refs