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Published 2024 | Version v1
Journal article

Tailoring Zr-N tin film characteristics on Ti-6Al-4 V alloy: Effect of nitrogen and bias voltage

  • 1. Centre de Développement Des Technologies Avancées (CDTA), Alger (Algeria)
  • 2. Centre de Recherche en Technologies Industrielles (CRTI), Alger (Algeria)
  • 3. Centre de Recherche en Technologie Des Semi-Conducteurs Pour L'Energétique (CRTSE), Alger (Algeria)
  • 4. Université Ferhat Abbas-Sétif 1, Sétif (Algeria)

Description

This work investigated the effect of varying N2 content (0 to 25%) and negative substrate bias voltage (0 to − 100 V) on the structure, surface wettability, and electrochemical properties of Zr-N thin films deposited on Ti-6Al-4V alloy using reactive radiofrequency (RF) magnetron sputtering. XRD analysis confirmed the presence of different phases, including Zr, ZrN, ZrNx, and Zr3N4. We demonstrated that in addition to roughness, the nitrogen content also affects the wettability properties. The corrosion resistance behavior was studied using electrochemical impedance spectroscopy in simulated body fluid (SBF) solution. Results showed that the electrochemical impedance decreases with decreasing contact angle, while the constant phase element (CPE) value decreases with increasing roughness and exhibits higher charge transfer resistance. (author)

Additional details

Publishing Information

Journal Title
Brazilian Journal of Physics (Online)
Journal Volume
54
Journal Issue
3
Journal Page Range
1 p.
ISSN
1678-4448