Design and Fabrication of Polarization-Independent Micro-Ring Resonators
- 1. Laboratory on Optoelectronic Systems, Institute of Semiconductors, Chinese Academy of Sciences, PO Box 912, Beijing 100083 (China)
Description
Origin of polarization sensitivity of photonic wire waveguides (PWWs) is analysed and the effective refractive indices of two different polarization states are calculated by the three-dimensional full-vector beam propagation method. We find that PWWs are polarization insensitive if the distribution of its refractive index is uniform and the cross section is square. An MRR based on such a polarization-insensitive PWW is fabricated on an 8-inch silicon-on-insulator wafer using 248-nm deep ultraviolet lithography and reactive ion etching. The quasi-TE mode is resonant at 1542.25 nm and 1558.90nm, and the quasi-TM mode is resonant at 1542.12 nm and 1558.94 nm. The corresponding polarization shift is 0.13 nm at the shorter wavelength and 0.04 nm at the longer wavelength. Thus the fabricated device is polarization independent. The extinction ratio is larger than 10 dB. The 3 dB bandwidth is about 2.5 nm and the Qvalue is about 620 at 1558.90 nm
Availability note (English)
Available from http://dx.doi.org/10.1088/0256-307X/25/4/046Additional details
Identifiers
Publishing Information
- Journal Title
- Chinese Physics Letters
- Journal Volume
- 25
- Journal Issue
- 4
- Journal Page Range
- p. 1333-1335
- ISSN
- 0256-307X
- CODEN
- CPLEEU
INIS
- Country of Publication
- China
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44112805
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- DESIGN; ELECTRICAL INSULATORS; ETCHING; FABRICATION; PHOTON BEAMS; POLARIZATION; REFRACTIVE INDEX; RESONATORS; SENSITIVITY; SILICON; THREE-DIMENSIONAL CALCULATIONS; ULTRAVIOLET RADIATION; WAVEGUIDES; WAVELENGTHS
- Descriptors DEC
- BEAMS; ELECTRICAL EQUIPMENT; ELECTROMAGNETIC RADIATION; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; OPTICAL PROPERTIES; PHYSICAL PROPERTIES; RADIATIONS; SEMIMETALS; SURFACE FINISHING