Published January 2001 | Version v1
Journal article

Plasma-assisted MOCVD growth of superconducting NbN thin films using Nb dialkylamide and Nb alkylimide precursors

  • 1. Northwestern Univ., Evanston, IL (United States). Dept. of Materials Science and Engineering
  • 2. Northwestern Univ., Evanston, IL (United States). Dept. of Chemistry
  • 3. Northwestern Univ., Evanston, IL (United States). Dept. of Electrical and Computer Engineering

Description

The first example of the use of metal-organic precursors for depositing NbN superconducting thin films is described. The study, which employed niobium(IV) and niobium(V) pulsed source precursors and hydrazine plasma as the nitrogen source, indicates that Tc is highly dependent on the lattice parameters and level of oxygen impurities, which are in turn governed by growth and post-deposition annealing temperatures. (orig.)

Additional details

Publishing Information

Journal Title
Chemical Vapor Deposition
Journal Volume
7
Journal Issue
1
Series
Issued within Advanced Materials v. 13(2)
Journal Page Range
p. 25-28
ISSN
0948-1907
CODEN
CVDEFX

Optional Information

Notes
29 refs.