Two-dimensional LIF measurements of humidity and OH density resulting from evaporated water from a wet surface in plasma for medical use
- 1. Department of Advanced Energy, The University of Tokyo, 5-1-5 Kashiwanoha, Kashiwa, Chiba, 227-8568 (Japan)
- 2. Department of Electrical Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 113-8656 (Japan)
- 3. Department of Electrical Engineering and Computer Science, Iwate University, 4-3-5 Ueda, Morioka, Iwate 020-8551 (Japan)
Description
In plasma medicine, plasma is applied to a wet surface and is often accompanied by dry-gas flow. The dry-gas flow affects water evaporation from the wet surface and influences production of reactive species derived from water vapor, such as OH radicals. In this study, the effect of the dry-gas flow on two-dimensional distributions of humidity and OH radical density are examined by measuring them using laser-induced fluorescence (LIF). First, humidity is measured when nitrogen flows from a quartz tube of 4 mm inner diameter onto distilled water and agar media from 5 mm distance. NO gas is added to the nitrogen as a tracer and humidity is obtained from the quenching rate of NO molecules measured using LIF. This measurement has a spatial resolution of 0.2 mm3 and a temporal resolution of less than 220 ns. The two-dimensional humidity distribution shows that the dry-gas flow pushes away water vapor evaporating from the wet surface. As a result, a low-humidity region is formed near the quartz tube nozzle and a high-humidity region is formed near the wet surface. The thickness of the low-humidity region reduces with increasing gas flow rate. It is 0.1–0.5 mm for the flow rate of higher than 0.3 l min−1. Next, the OH density is measured when a nanosecond pulsed streamer discharge is applied to a distilled water surface with dry-air flow. The OH density decreases with increasing gas flow rate due to decreased humidity. When the flow rate is lower than 0.1 l min−1, the OH distribution is approximately uniform in the plasma region, while the humidity distribution shows a large gradient. The importance of the thin high-humidity region on the flux of reactive species onto the wet surface is discussed. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/0963-0252/24/1/015002Additional details
Identifiers
Publishing Information
- Journal Title
- Plasma Sources Science and Technology
- Journal Volume
- 24
- Journal Issue
- 1
- Journal Page Range
- [8 p.]
- ISSN
- 0963-0252
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46068056
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- AIR FLOW; FLOW RATE; FLUORESCENCE; HYDROXYL RADICALS; LASER RADIATION; MOLECULES; NITRIC OXIDE; PLASMA; QUARTZ; QUENCHING; SPATIAL RESOLUTION; SURFACES; TWO-DIMENSIONAL CALCULATIONS; WATER VAPOR
- Descriptors DEC
- CHALCOGENIDES; ELECTROMAGNETIC RADIATION; EMISSION; FLUID FLOW; FLUIDS; GAS FLOW; GASES; LUMINESCENCE; MINERALS; NITROGEN COMPOUNDS; NITROGEN OXIDES; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; PHOTON EMISSION; RADIATIONS; RADICALS; RESOLUTION; VAPORS