Published April 6, 2011 | Version v1
Journal article

Dielectric breakdown in AlOx tunnelling barriers

  • 1. Universidade Federal de Santa Maria, Departamento de Fisica, Av. Roraima, 1000, Santa Maria 97105-900, RS (Brazil)
  • 2. Universidade Federal do Rio Grande do Sul, Instituto de Fisica, Av. Bento Goncalves, 9500, Caixa Postal 15051, Porto Alegre 91501-970, RS (Brazil)

Description

We studied the dielectric breakdown in tunnelling barriers produced by plasma-assisted oxidation of an aluminium surface. The barrier mean height, thickness and the effective tunnelling area were extracted from current versus voltage curves measured at room temperature. The effective tunnelling area ranged from 10-10 to 10-5 cm2, corresponding to less than 1% of the geometrical surface of the samples. The estimated electrical field to breakdown agreed with predictions from thermochemical models, and decreased exponentially with the effective tunnelling area.

Availability note (English)

Available from http://dx.doi.org/10.1088/0022-3727/44/13/135403

Additional details

Identifiers

DOI
10.1088/0022-3727/44/13/135403;
PII
S0022-3727(11)69741-6;

Publishing Information

Journal Title
Journal of Physics. D, Applied Physics
Journal Volume
44
Journal Issue
13
Journal Page Range
[5 p.]
ISSN
0022-3727
CODEN
JPAPBE

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
43031652
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
ALUMINIUM; BREAKDOWN; DIELECTRIC MATERIALS; ELECTRIC FIELDS; ELECTRIC POTENTIAL; FORECASTING; OXIDATION; PLASMA; SURFACES; THICKNESS; TUNNEL EFFECT
Descriptors DEC
CHEMICAL REACTIONS; DIMENSIONS; ELEMENTS; MATERIALS; METALS