Published April 6, 2011
| Version v1
Journal article
Dielectric breakdown in AlOx tunnelling barriers
- 1. Universidade Federal de Santa Maria, Departamento de Fisica, Av. Roraima, 1000, Santa Maria 97105-900, RS (Brazil)
- 2. Universidade Federal do Rio Grande do Sul, Instituto de Fisica, Av. Bento Goncalves, 9500, Caixa Postal 15051, Porto Alegre 91501-970, RS (Brazil)
Description
We studied the dielectric breakdown in tunnelling barriers produced by plasma-assisted oxidation of an aluminium surface. The barrier mean height, thickness and the effective tunnelling area were extracted from current versus voltage curves measured at room temperature. The effective tunnelling area ranged from 10-10 to 10-5 cm2, corresponding to less than 1% of the geometrical surface of the samples. The estimated electrical field to breakdown agreed with predictions from thermochemical models, and decreased exponentially with the effective tunnelling area.
Availability note (English)
Available from http://dx.doi.org/10.1088/0022-3727/44/13/135403Additional details
Identifiers
- DOI
- 10.1088/0022-3727/44/13/135403;
- PII
- S0022-3727(11)69741-6;
Publishing Information
- Journal Title
- Journal of Physics. D, Applied Physics
- Journal Volume
- 44
- Journal Issue
- 13
- Journal Page Range
- [5 p.]
- ISSN
- 0022-3727
- CODEN
- JPAPBE
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 43031652
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- ALUMINIUM; BREAKDOWN; DIELECTRIC MATERIALS; ELECTRIC FIELDS; ELECTRIC POTENTIAL; FORECASTING; OXIDATION; PLASMA; SURFACES; THICKNESS; TUNNEL EFFECT
- Descriptors DEC
- CHEMICAL REACTIONS; DIMENSIONS; ELEMENTS; MATERIALS; METALS