Applying the pulsed ion chamber methodology to full range reactor power measurements

A computer based/controlled PIC solid state electronic system is presented in its entirety. Its operation is described and evaluated both as a plasma diagnostic instrument and a basic reactor power measurement system. The system, in conjunction with two sets of matched ionization chambers (one with a 93 percent enriched 235U coating the other without), is evaluated in terms of response in radiation fields of 102 to 3 x 106 R/hr at temperatures ranging from 250C to 4750C. Two different sets of chambers were used, one containing Ar-5 percent N2, the other Ne. Gamma compensation to within approximately +-5 percent proved feasible, at a given temperature from, 103 to 3 x 106 R/hr. The chambers' responses altered over the temperature range used. The PIC signal for neon at 3 x 106 R/hr and 250C was 2.03V where at 4320C it was 4.75V. For the Ar--5 percent N2 chambers under the same conditions the signal increased from 1.9V to 2.74 volts. The Ar--N2 chamber temperature response was expected. The Ne temperature response was constant up to 2820C as predicted. However, at this temperature the signal began to show a slow increasing trend which continued up to the maximum temperature used, 4750C. This requires more study