Published February 1, 2014
| Version v1
Journal article
Non-equilibrium deposition of phase pure Cu2O thin films at reduced growth temperature
Creators
- 1. Department of Metallurgical and Materials Engineering, Colorado School of Mines, Golden, Colorado 80401 (United States)
- 2. National Renewable Energy Laboratory, Golden, Colorado 80401 (United States)
Description
Cuprous oxide (Cu2O) is actively studied as a prototypical material for energy conversion and electronic applications. Here we reduce the growth temperature of phase pure Cu2O thin films to 300 °C by intentionally controlling solely the kinetic parameter (total chamber pressure, Ptot) at fixed thermodynamic condition (0.25 mTorr pO2). A strong non-monotonic effect of Ptot on Cu-O phase formation is found using high-throughput combinatorial-pulsed laser deposition. This discovery creates new opportunities for the growth of Cu2O devices with low thermal budget and illustrates the importance of kinetic effects for the synthesis of metastable materials with useful properties
Additional details
Identifiers
- DOI
- 10.1063/1.4865457;
Publishing Information
- Journal Title
- APL Materials
- Journal Volume
- 2
- Journal Issue
- 2
- Journal Page Range
- p. 022105-022105.6
- ISSN
- 2166-532X
- CODEN
- AMPADS
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45090789
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; S36: MATERIALS SCIENCE;
- Descriptors DEI
- COPPER OXIDES; ENERGY BEAM DEPOSITION; ENERGY CONVERSION; LASER RADIATION; PULSED IRRADIATION; SYNTHESIS; THIN FILMS
- Descriptors DEC
- CHALCOGENIDES; CONVERSION; COPPER COMPOUNDS; DEPOSITION; ELECTROMAGNETIC RADIATION; FILMS; IRRADIATION; OXIDES; OXYGEN COMPOUNDS; RADIATIONS; SURFACE COATING; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Notes
- (c) 2014 Author(s)