Published February 1, 2014 | Version v1
Journal article

Non-equilibrium deposition of phase pure Cu2O thin films at reduced growth temperature

  • 1. Department of Metallurgical and Materials Engineering, Colorado School of Mines, Golden, Colorado 80401 (United States)
  • 2. National Renewable Energy Laboratory, Golden, Colorado 80401 (United States)

Description

Cuprous oxide (Cu2O) is actively studied as a prototypical material for energy conversion and electronic applications. Here we reduce the growth temperature of phase pure Cu2O thin films to 300 °C by intentionally controlling solely the kinetic parameter (total chamber pressure, Ptot) at fixed thermodynamic condition (0.25 mTorr pO2). A strong non-monotonic effect of Ptot on Cu-O phase formation is found using high-throughput combinatorial-pulsed laser deposition. This discovery creates new opportunities for the growth of Cu2O devices with low thermal budget and illustrates the importance of kinetic effects for the synthesis of metastable materials with useful properties

Additional details

Identifiers

Publishing Information

Journal Title
APL Materials
Journal Volume
2
Journal Issue
2
Journal Page Range
p. 022105-022105.6
ISSN
2166-532X
CODEN
AMPADS

Optional Information

Notes
(c) 2014 Author(s)