Published June 1, 2004
| Version v1
Journal article
Computer-aided simulation of a rotary sputtering magnetron
Creators
- 1. Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109 (United States)
- 2. Department of Mechanical Engineering, Center for Mechanical Technology and Automation, University of Aveiro, 3810 Aveiro (Portugal)
Description
In the past, computer-aided simulation of sputtering magnetron has been applied mainly to planar cathodes with flat target surfaces. In this work, we have simulated the target erosion profile of a cylindrical rotary magnetron by tracing electron trajectories and predicting ionization distribution. The electric potential is prescribed as a radial function. A fourth-order Runge-Kutta method is used to solve the electron movement equations, and a Monte Carlo method is employed to predict electron/Ar collision. It is shown that the simulation can predict the target erosion with reasonable accuracy
Additional details
Identifiers
- DOI
- 10.1063/1.1715133;
Publishing Information
- Journal Title
- Journal of Applied Physics
- Journal Volume
- 95
- Journal Issue
- 11
- Journal Page Range
- p. 6017-6020
- ISSN
- 0021-8979
- CODEN
- JAPIAU
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 36010346
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S36: MATERIALS SCIENCE;
- Descriptors DEI
- CATHODES; COMPUTERIZED SIMULATION; CYLINDRICAL CONFIGURATION; ELECTRIC POTENTIAL; ELECTRONS; EROSION; IONIZATION; MAGNETRONS; MONTE CARLO METHOD; RUNGE-KUTTA METHOD; SPUTTERING; TRAJECTORIES
- Descriptors DEC
- CALCULATION METHODS; CONFIGURATION; ELECTRODES; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTARY PARTICLES; EQUIPMENT; FERMIONS; ITERATIVE METHODS; LEPTONS; MATHEMATICAL SOLUTIONS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; NUMERICAL SOLUTION; SIMULATION
Optional Information
- Notes
- (c) 2004 American Institute of Physics.