Coulomb impurity scattering in topological insulator thin films
- 1. Department of Electrical Engineering, University of California, Riverside, California 92521 (United States)
- 2. Texas Center for Superconductivity and Department of Physics, University of Houston, Houston, Texas 77204 (United States)
Description
Inter-surface coupling in thin-film topological insulators can reduce the surface state mobility by an order of magnitude in low-temperature transport measurements. The reduction is caused by a reduction in the group velocity and an increased sz component of the surface-state spin which weakens the selection rule against large-angle scattering. An intersurface potential splits the degenerate bands into a Rashba-like bandstructure. This reduces the intersurface coupling, it largely restores the selection rule against large angle scattering, and the ring-shaped valence band further reduces backscattering by requiring, on average, larger momentum transfer for backscattering events. The effects of temperature, Fermi level, and intersurface potential on the Coulomb impurity scattering limited mobility are analyzed and discussed.
Additional details
Identifiers
- DOI
- 10.1063/1.4891574;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 105
- Journal Issue
- 3
- Journal Page Range
- p. 033118-033118.4
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46017334
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- BACKSCATTERING; CARRIER MOBILITY; COUPLING; DIELECTRIC MATERIALS; FERMI LEVEL; IMPURITIES; MOMENTUM TRANSFER; SCATTERING; SELECTION RULES; SPIN; SURFACES; THIN FILMS; TOPOLOGY
- Descriptors DEC
- ANGULAR MOMENTUM; ENERGY LEVELS; FILMS; MATERIALS; MATHEMATICS; MOBILITY; PARTICLE PROPERTIES; SCATTERING
Optional Information
- Notes
- (c) 2014 AIP Publishing LLC