Published July 21, 2014 | Version v1
Journal article

Coulomb impurity scattering in topological insulator thin films

  • 1. Department of Electrical Engineering, University of California, Riverside, California 92521 (United States)
  • 2. Texas Center for Superconductivity and Department of Physics, University of Houston, Houston, Texas 77204 (United States)

Description

Inter-surface coupling in thin-film topological insulators can reduce the surface state mobility by an order of magnitude in low-temperature transport measurements. The reduction is caused by a reduction in the group velocity and an increased sz component of the surface-state spin which weakens the selection rule against large-angle scattering. An intersurface potential splits the degenerate bands into a Rashba-like bandstructure. This reduces the intersurface coupling, it largely restores the selection rule against large angle scattering, and the ring-shaped valence band further reduces backscattering by requiring, on average, larger momentum transfer for backscattering events. The effects of temperature, Fermi level, and intersurface potential on the Coulomb impurity scattering limited mobility are analyzed and discussed.

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
105
Journal Issue
3
Journal Page Range
p. 033118-033118.4
ISSN
0003-6951
CODEN
APPLAB

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
46017334
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
BACKSCATTERING; CARRIER MOBILITY; COUPLING; DIELECTRIC MATERIALS; FERMI LEVEL; IMPURITIES; MOMENTUM TRANSFER; SCATTERING; SELECTION RULES; SPIN; SURFACES; THIN FILMS; TOPOLOGY
Descriptors DEC
ANGULAR MOMENTUM; ENERGY LEVELS; FILMS; MATERIALS; MATHEMATICS; MOBILITY; PARTICLE PROPERTIES; SCATTERING

Optional Information

Notes
(c) 2014 AIP Publishing LLC