The Bipolar Field-Effect Transistor: XIII. Physical Realizations of the Transistor and Circuits (One-Two-MOS-Gates on Thin-Thick Pure-Impure Base)
Creators
- 1. Chinese Academy of Sciences, Foreign Member, Beijing 100864 (China)
- 2. Peking University, Beijing 100871 (China)
Description
This paper reports the physical realization of the Bipolar Field-Effect Transistor (BiFET) and its one-transistor basic building block circuits. Examples are given for the one and two MOS gates on thin and thick, pure and impure base, with electron and hole contacts, and the corresponding theoretical current-voltage characteristics previously computed by us, without generation-recombination-trapping-tunneling of electrons and holes. These examples include the one-MOS-gate on semi-infinite thick impure base transistor (the bulk transistor) and the impurethin-base Silicon-on-Insulator (SOI) transistor and the two-MOS-gates on thin base transistors (the FinFET and the Thin Film Transistor TFT). Figures are given with the cross-section views containing the electron and hole concentration and current density distributions and trajectories and the corresponding DC current-voltage characteristics.
Availability note (English)
Available from http://dx.doi.org/10.1088/1674-4926/30/2/021001Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Semiconductors
- Journal Volume
- 30
- Journal Issue
- 2
- Journal Page Range
- [12 p.]
- ISSN
- 1674-4926
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41079246
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- ELECTRIC POTENTIAL; ELECTRONS; FIELD EFFECT TRANSISTORS; HOLES; MOS TRANSISTORS; SILICON; SILICON OXIDES; THIN FILMS; TUNNEL EFFECT
- Descriptors DEC
- CHALCOGENIDES; ELEMENTARY PARTICLES; ELEMENTS; FERMIONS; FILMS; LEPTONS; OXIDES; OXYGEN COMPOUNDS; SEMICONDUCTOR DEVICES; SEMIMETALS; SILICON COMPOUNDS; TRANSISTORS