Published January 12, 2004
| Version v1
Journal article
Structural perturbations within Ge nanocrystals in silica
Creators
- 1. Department of Electronic Materials Engineering, Research School of Physical Sciences and Engineering, Australian National University, Canberra (Australia)
- 2. Australian Nuclear Science and Technology Organisation, Menai (Australia)
Description
Extended x-ray absorption fine structure (EXAFS) spectroscopy was used to identify structural perturbations in Ge nanocrystals produced in silica by ion implantation and annealing. Although the nanocrystals retained tetrahedral coordination, both the short- and medium-range orders were perturbed relative to bulk crystalline material. Equivalently, the nanocrystal interatomic distance distribution deviated from that of bulk crystalline Ge, exhibiting enhanced structural disorder of both Gaussian and non-Gaussian forms in the first, second, and third nearest-neighbor shells. The relative influences of nanocrystal size, bonding distortions, multiple phases, and a matrix-induced compression were considered
Additional details
Identifiers
- DOI
- 10.1063/1.1639136;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 84
- Journal Issue
- 2
- Journal Page Range
- p. 278-280
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 36027977
- Subject category
- S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ABSORPTION; ANNEALING; BONDING; DISTURBANCES; FINE STRUCTURE; GERMANIUM; INTERATOMIC DISTANCES; ION IMPLANTATION; NANOSTRUCTURES; SILICA; SILICON COMPOUNDS; X-RAY SPECTROSCOPY
- Descriptors DEC
- DISTANCE; ELEMENTS; FABRICATION; HEAT TREATMENTS; JOINING; METALS; MINERALS; OXIDE MINERALS; SORPTION; SPECTROSCOPY
Optional Information
- Notes
- (c) 2004 American Institute of Physics.