Published October 22, 1992 | Version v1
Patent Metadata-only

High frequency heating device

Creators

  • 1. Japan Atomic Energy Research Inst., Tokyo (Japan)

Description

Frequency control is conducted for the outputted high-frequency from a source oscillator so that electric reflection power is reduced to less than a predetermined level. Even if the electric reflection power from a high-frequency heating antenna changes greatly, a frequency controlling circuit shifts the frequency always in the direction of decreasing the reflectance and, accordingly, reflection power can be reduced instantaneously. Even if the reflection power fluctuates at such a high speed that a matching device can not follow, constant high frequency can always be applied to plasmas without lowering the output level of the high frequency power outputted from an exciting amplifier. (N.H.)

Availability note (English)

Available from JAPIO. Also available from INPADOC.

Additional details

Publishing Information

Imprint Pagination
6 p.
IPC:
Int. Cl. G21B1/00; H05H1/18.
IPC
Int. Cl. G21B1/00; H05H1/18.
Patent number
JP patent document 4-299282/A/

INIS

Country of Publication
Japan
Country of Input or Organization
Japan
INIS RN
24048812
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Non-conventional Literature
Descriptors DEI
ANTENNAS; FREQUENCY CONTROL; FREQUENCY DEPENDENCE; HIGH-FREQUENCY HEATING; IMPEDANCE; OSCILLATORS; PLASMA; POWER SUPPLIES; REFLECTION; THERMONUCLEAR DEVICES
Descriptors DEC
CONTROL; ELECTRICAL EQUIPMENT; ELECTRONIC EQUIPMENT; EQUIPMENT; HEATING; PLASMA HEATING

Optional Information

Secondary number(s)
JP patent application 3-64784.