Published June 1983 | Version v1
Journal article

Improving the performance of fast high-power silicon devices exposed to gamma rays from Co60

Description

A method is reported for improving the performance of fast high-power silicon devices. The method is based on heat-treating silicon p--n junctions after exposure to γ rays so that the radiation-induced defects responsible for increased device current are annealed. As a result, the concentration of radiation defects, which determines the lifetime of the carriers, remains unchanged

Additional details

Publishing Information

Journal Title
Sov. Phys. - Tech. Phys. (Engl. Transl.)
Journal Volume
28
Journal Issue
6
Series
Sov. Phys. - Tech. Phys. (Engl. Transl.).
Journal Page Range
692-694
ISSN
0038-5662

Optional Information

Notes
Cover-to-cover translation of Zhurnal Tekhnicheskoj Fiziki (USSR).