Published August 2006 | Version v1
Journal article Metadata-only

The nitriding of aluminium by dense plasma focus

Creators

  • 1. Physics Department, Quaid-i-Azam University, 45320 Islamabad (Pakistan)
  • 2. PINSTECH, PO Box 1331, 44000 Islamabad (Pakistan)

Description

High current, short length nitrogen ion beam pulses emanating from a low energy (1.8 kJ) Mather type plasma focus device are utilized for room temperature surface nitriding of aluminium specimens. X-ray diffraction (XRD), scanning electron microscopy and microhardness are used to study the surfaces of untreated and treated specimens. The surface hardness of the ion implanted specimens is found to improve by 300%. XRD studies reveal that the increase in microhardness is caused by the formation of cubic aluminium nitride phase

Availability note (English)

Available online at http://stacks.iop.org/0963-0252/15/295/psst6_3_001.pdf or at the Web site for the journal Plasma Sources Science and Technology (ISSN 1361-6595) http://www.iop.org/

Additional details

Identifiers

URL
http://stacks.iop.org/0963-0252/15/295/psst6_3_001.pdf;
DOI
10.1088/0963-0252/15/3/001;
PII
S0963-0252(06)05251-0;

Publishing Information

Journal Title
Plasma Sources Science and Technology
Journal Volume
15
Journal Issue
3
Journal Page Range
p. 295-301
ISSN
0963-0252

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
37063300
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
ALUMINIUM; ALUMINIUM NITRIDES; BEAM PULSERS; ELECTRIC CURRENTS; ION IMPLANTATION; MICROHARDNESS; NITROGEN IONS; PLASMA FOCUS; PLASMA FOCUS DEVICES; SCANNING ELECTRON MICROSCOPY; SURFACES; X-RAY DIFFRACTION
Descriptors DEC
ALUMINIUM COMPOUNDS; CHARGED PARTICLES; COHERENT SCATTERING; CURRENTS; DIFFRACTION; ELECTRON MICROSCOPY; ELEMENTS; HARDNESS; IONS; MECHANICAL PROPERTIES; METALS; MICROSCOPY; NITRIDES; NITROGEN COMPOUNDS; OPEN PLASMA DEVICES; PNICTIDES; SCATTERING; THERMONUCLEAR DEVICES