Published May 2011 | Version v1
Journal article

Effects of gas pressure on 60/13.56 MHz dual-frequency capacitively coupled plasmas

  • 1. Key Laboratory of Atomic and Molecular Physics and Functional Materials of Gansu Province, College of Physics and Electronic Engineering, Northwest Normal University, Lanzhou 730070 (China)
  • 2. School of Physical Science and Technology, Suzhou University, SuZhou 215006 (China)

Description

The electron energy probability functions (EEPFs) were measured with increasing gas pressure in 60/13.56 MHz dual-frequency capacitively coupled plasma (DF-CCP) using compensated Langmiur electrostatic probe. The transition pressure of heating mode from collisionless to collisional heating in 60/13.56 MHz DF-CCP is found to be significantly lower than that in 13.56 MHz single-frequency CCP. As the pressure increases, the EEPFs change from bi-Maxwellian to Druyvesteyn type which is similar with that in 60 MHz single-frequency CCP. The pressure dependence of electron densities, effective electron temperatures, floating potentials, and plasma potentials in 60/13.56 MHz DF-CCP were measured and were compared with that in 60 MHz single-frequency CCP. The pressure dependence of these plasma parameters in 60/13.56 MHz DF-CCP is similar with that in 60 MHz single-frequency CCP.

Additional details

Identifiers

Publishing Information

Journal Title
Physics of Plasmas
Journal Volume
18
Journal Issue
5
Journal Page Range
p. 053501-053501.6
ISSN
1070-664X
CODEN
PHPAEN

Optional Information

Notes
(c) 2011 American Institute of Physics