Tailoring the magnetoimpedance effect of NiFe/Ag multilayer
- 1. Departamento de Fisica Teorica e Experimental, Universidade Federal do Rio Grande do Norte, 59078-970 Natal, RN (Brazil)
- 2. Escola de Ciencias e Tecnologia, Universidade Federal do Rio Grande do Norte, 59072-970, Natal, RN (Brazil)
- 3. Campus Cacapava do Sul, Universidade Federal do Pampa, 96570-000, Cacapava do Sul, RS (Brazil)
- 4. Departamento de Fisica, Universidade Federal de Santa Catarina, 88010-970, Florianopolis, SC (Brazil)
- 5. Centro Brasileiro de Pesquisas Fisicas, 22280-180, Rio de Janeiro, RJ (Brazil)
Description
The magnetoimpedance (MI) effect was investigated in NiFe/Ag multilayered (ML) and ML/SiO2/Ag/SiO2/ML structured multilayered (SD) ferromagnetic films grown by magnetron sputtering. The MI measurements were performed with an impedance analyzer over a wide frequency range, from 10 MHz to 1.8 GHz. Sample geometries are mainly responsible for the different MI behaviours and by considering the entire frequency range, distinct mechanisms responsible for MI changes were associated. For the ML sample, a maximum value of 80%, associated with the appearance of ferromagnetic resonance (FMR), was reached at around 1 GHz. For the SD sample, the striking feature is the existence of two distinct frequency ranges with high MI% values of 80% at around 100 MHz, related to the skin and magnetoinductive effects, and of 120% at around 1 GHz, associated with the strong skin and FMR effect.
Availability note (English)
Available from http://dx.doi.org/10.1088/0022-3727/43/29/295004Additional details
Identifiers
- DOI
- 10.1088/0022-3727/43/29/295004;
- PII
- S0022-3727(10)57382-0;
Publishing Information
- Journal Title
- Journal of Physics. D, Applied Physics
- Journal Volume
- 43
- Journal Issue
- 29
- Journal Page Range
- [7 p.]
- ISSN
- 0022-3727
- CODEN
- JPAPBE
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 42059653
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- CRYSTAL GROWTH; FERROMAGNETIC RESONANCE; FILMS; GHZ RANGE 01-100; IMPEDANCE; IRON ALLOYS; LAYERS; MHZ RANGE; NICKEL ALLOYS; SILICON OXIDES; SILVER; SPUTTERING
- Descriptors DEC
- ALLOYS; CHALCOGENIDES; ELEMENTS; FREQUENCY RANGE; GHZ RANGE; MAGNETIC RESONANCE; METALS; OXIDES; OXYGEN COMPOUNDS; RESONANCE; SILICON COMPOUNDS; TRANSITION ELEMENT ALLOYS; TRANSITION ELEMENTS