Published June 1, 2018 | Version v1
Journal article

Recent progress in GeSn growth and GeSn-based photonic devices

  • 1. Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083 (China)

Description

The GeSn binary alloy is a new group IV material that exhibits a direct bandgap when the Sn content exceeds 6%. It shows great potential for laser use in optoelectronic integration circuits (OEIC) on account of its low light emission efficiency arising from the indirect bandgap characteristics of Si and Ge. The bandgap of GeSn can be tuned from 0.6 to 0 eV by varying the Sn content, thus making this alloy suitable for use in near-infrared and mid-infrared detectors. In this paper, the growth of the GeSn alloy is first reviewed. Subsequently, GeSn photodetectors, light emitting diodes, and lasers are discussed. The GeSn alloy presents a promising pathway for the monolithic integration of Si photonic circuits by the complementary metal–oxide–semiconductor (CMOS) technology. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-4926/39/6/061006

Additional details

Publishing Information

Journal Title
Journal of Semiconductors
Journal Volume
39
Journal Issue
6
Journal Page Range
[6 p.]
ISSN
1674-4926

INIS

Country of Publication
China
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
51067281
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ALLOYS; BINARY ALLOY SYSTEMS; CMOS CIRCUITS; EFFICIENCY; EMISSION; EQUIPMENT; LASERS; LIGHT EMITTING DIODES; PHOTODETECTORS; POTENTIALS; SEMICONDUCTOR MATERIALS
Descriptors DEC
ALLOY SYSTEMS; ELECTRONIC CIRCUITS; INTEGRATED CIRCUITS; MATERIALS; MICROELECTRONIC CIRCUITS; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DIODES