Recent progress in GeSn growth and GeSn-based photonic devices
- 1. Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083 (China)
Description
The GeSn binary alloy is a new group IV material that exhibits a direct bandgap when the Sn content exceeds 6%. It shows great potential for laser use in optoelectronic integration circuits (OEIC) on account of its low light emission efficiency arising from the indirect bandgap characteristics of Si and Ge. The bandgap of GeSn can be tuned from 0.6 to 0 eV by varying the Sn content, thus making this alloy suitable for use in near-infrared and mid-infrared detectors. In this paper, the growth of the GeSn alloy is first reviewed. Subsequently, GeSn photodetectors, light emitting diodes, and lasers are discussed. The GeSn alloy presents a promising pathway for the monolithic integration of Si photonic circuits by the complementary metal–oxide–semiconductor (CMOS) technology. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1674-4926/39/6/061006Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Semiconductors
- Journal Volume
- 39
- Journal Issue
- 6
- Journal Page Range
- [6 p.]
- ISSN
- 1674-4926
INIS
- Country of Publication
- China
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 51067281
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALLOYS; BINARY ALLOY SYSTEMS; CMOS CIRCUITS; EFFICIENCY; EMISSION; EQUIPMENT; LASERS; LIGHT EMITTING DIODES; PHOTODETECTORS; POTENTIALS; SEMICONDUCTOR MATERIALS
- Descriptors DEC
- ALLOY SYSTEMS; ELECTRONIC CIRCUITS; INTEGRATED CIRCUITS; MATERIALS; MICROELECTRONIC CIRCUITS; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DIODES