Published July 2000 | Version v1
Journal article

Phase analysis in α-Fe after high-dose Si ion implantation by depth-selective conversion-electron Moessbauer spectroscopy (DCEMS)

  • 1. Gerhard-Mercator-Universitaet Duisburg, Laboratorium fuer Angewandte Physik (Germany)
  • 2. Institut fuer Ionenstrahlphysik und Materialforschung, Forschungszentrum Rossendorf e.V. (Germany)

Description

Si+ ions of 50 keV in energy were implanted into α-Fe (95% 57Fe) with a nominal dose of 5 x 1017 cm-2 at 350 deg. C. The depth distribution of the Fe-Si phases formed by ion implantation after annealing at 300 and 400 deg. C for 1 h was studied quantitatively by depth-selective conversion-electron Moessbauer spectroscopy (DCEMS). Ordered Fe3Si and ε-FeSi was observed

Additional details

Identifiers

Publishing Information

Journal Title
Hyperfine Interactions
Journal Volume
126
Journal Issue
1-4
Journal Page Range
p. 219-222
ISSN
0304-3843
CODEN
HYINDN

Conference

Title
International conference on the applications of the Moessbauer effect (ICAME)
Dates
29 Aug - 3 Sep 1999
Place
Garmisch (Germany)

Optional Information

Copyright
Copyright (c) 2000 Kluwer Academic Publishers