Published April 1994 | Version v1
Journal article

Electrical properties of ZrO2-Y2O3, HfO2-Nd2O3, HfO2-Y2O3 system films

  • 1. Odesskij Politekhnicheskij Inst., Odessa (Ukraine)

Description

Electrophysical properties of ZrO2-Y2O3, HfO2-Nd2O3 system films in dependence on the conditions of their obtaining are studied. Introduction of REE oxides in ZrO2 and HfO2 films permits to stabilize the electrophysical parameters of the films in wide intervals of the substrate temperatures and layer growth rates

Additional details

Additional titles

Original title (Russian)
Электрофизические свойства пленок систем ZrO

Publishing Information

Journal Title
Neorganicheskie Materialy
Journal Volume
30
Journal Issue
4
Journal Page Range
p. 556-558.
ISSN
0002-337X
CODEN
NEOMB8