Published November 21, 2003 | Version v1
Journal article

Active control of instabilities for plasma processing with electronegative gases

  • 1. MKS Instruments, Inc., Wilmington, MA 01887 (United States)
  • 2. Lam Research Corp., Fremont, CA 94538 (United States)

Description

Feedback stabilization of instabilities was demonstrated in inductively coupled electronegative plasmas by modulating the radio frequency power in response to a feedback control signal. Two modes were observed and stabilized: a fast bursting mode (designated 'B' mode) and a slower oscillatory mode (designated 'O' mode). 'B' mode is a low duty-cycle non-linear phenomenon characterized by short (<1 μs) spikes on optical signals, at a pulse repetition rate of 10-40 kHz. 'O' mode is characterized by continuous oscillations in ion saturation current at lower frequency (200 Hz-1 kHz). Some parameter ranges exhibit both modes. Fluctuations in similar processing plasmas and having similar characteristics have previously been observed and identified with instability due to electron attachment to the electronegative neutral gas species. Because 'O' mode exhibits fluctuations in ion density, it may be of more concern than 'B' mode for repeatable plasma processing. Stabilization of 'O' mode may be accomplished using the ion saturation current signal collected by a Langmuir probe as a measure of the plasma density. The floating potential obtained from the capacitively coupled plasma bias electrode is similar in shape to the ion saturation current, and can also be used as the feedback control signal. The bandwidth required for stabilizing the 'O' mode is in the kHz range, whereas the bandwidth required to stabilize 'B' mode may be closer to a MHz. In practice, it is far easier to stabilize the 'O' mode than the 'B' mode, but both may be effectively suppressed. However, since a purely 'B' mode does not seem to measurably modulate the ion density, and unless it dramatically changes the average electron temperature it may not be necessary to stabilize it in order to achieve repeatable plasma processing

Availability note (English)

Available online at http://stacks.iop.org/0022-3727/36/2845/d3_22_012.pdf or at the Web site for the Journal of Physics. D, Applied Physics (ISSN 1361-6463) http://www.iop.org/

Additional details

Publishing Information

Journal Title
Journal of Physics. D, Applied Physics
Journal Volume
36
Journal Issue
22
Journal Page Range
p. 2845-2852
ISSN
0022-3727
CODEN
JPAPBE

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
35028586
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
ELECTRON TEMPERATURE; ELECTRONEGATIVITY; FREQUENCY MODULATION; ION DENSITY; KHZ RANGE; LANGMUIR PROBE; PLASMA INSTABILITY; THERMAL SPIKES
Descriptors DEC
ELECTRIC PROBES; FREQUENCY RANGE; INSTABILITY; MODULATION; PROBES