Electrodeposition of aluminum from AlCl3/acetamide eutectic solvent
Creators
- 1. Key Laboratory for Ecological Metallurgy of Multimetallic Mineral (Ministry of Education) (China)
- 2. School of Materials and Metallurgy, Northeastern University, Shenyang 110819 (China)
Description
A new acetamide based eutectic solvent is obtained via complexation with AlCl3. The electrodeposition of aluminum is successfully achieved from AlCl3/acetamide eutectic solvent. The cyclic voltammograms on tungsten electrode indicate that Al(III) are easier to be reduced from AlCl3/acetamide eutectic solvent at a molar ratio in a range of 1.1 to 1.5. Aluminum coatings were prepared at −0.25 V (vs. Al/Al3+) and different temperatures at 313 K and 333 K in AlCl3/acetamide eutectic solvent at molar ratio = 1.3 (r = 1.3). The SEM images show that thick adherent aluminum films were deposited on the copper substrate. The EDS and XRD analysis confirm that the obtained deposits are pure aluminum. The present results allowed the new and cheap AlCl3/acetamide eutectic solvent to be a potential electrolyte for aluminum electrodeposition at room temperature.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.electacta.2015.09.008Additional details
Identifiers
- DOI
- 10.1016/j.electacta.2015.09.008;
- PII
- S0013-4686(15)30424-2;
Publishing Information
- Journal Title
- Electrochimica Acta
- Journal Volume
- 180
- Journal Page Range
- p. 811-814
- ISSN
- 0013-4686
- CODEN
- ELCAAV
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 48099411
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Descriptors DEI
- ACETAMIDE; ALUMINIUM CHLORIDES; ALUMINIUM IONS; ELECTRODEPOSITION; EUTECTICS; SCANNING ELECTRON MICROSCOPY; SOLVENTS; TEMPERATURE RANGE 0273-0400 K; X-RAY DIFFRACTION
- Descriptors DEC
- ALUMINIUM COMPOUNDS; ALUMINIUM HALIDES; AMIDES; CHARGED PARTICLES; CHLORIDES; CHLORINE COMPOUNDS; COHERENT SCATTERING; DEPOSITION; DIFFRACTION; ELECTROLYSIS; ELECTRON MICROSCOPY; HALIDES; HALOGEN COMPOUNDS; IONS; LYSIS; MICROSCOPY; ORGANIC COMPOUNDS; ORGANIC NITROGEN COMPOUNDS; SCATTERING; SURFACE COATING; TEMPERATURE RANGE
Optional Information
- Copyright
- Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.