Published January 7, 2015 | Version v1
Journal article

Thickness-dependent metal-insulator transition in epitaxial SrRuO3 ultrathin films

  • 1. Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973 (United States)
  • 2. National Laboratory of Solid State Microstructures, Department of Materials Science and Engineering, College of Engineering and Applied Science, and Collaborative Center of Advanced Materials, Nanjing University, Nanjing 210093 (China)
  • 3. Helmholtz-Zentrum Dresden-Rossendorf, Institute of Ion Beam Physics and Materials Research, Bautzner Landstr, 400, 01328 Dresden (Germany)

Description

Transport characteristics of ultrathin SrRuO3 films, deposited epitaxially on TiO2-terminated SrTiO3 (001) single-crystal substrates, were studied as a function of film thickness. Evolution from a metallic to an insulating behavior is observed as the film thickness decreases from 20 to 4 unit cells. In films thicker than 4 unit cells, the transport behavior obeys the Drude low temperature conductivity with quantum corrections, which can be attributed to weak localization. Fitting the data with 2-dimensional localization model indicates that electron-phonon collisions are the main inelastic relaxation mechanism. In the film of 4 unit cells in thickness, the transport behavior follows variable range hopping model, indicating a strongly localized state. Magnetoresistance measurements reveal a likely magnetic anisotropy with the magnetic easy axis along the out-of-plane direction

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Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
117
Journal Issue
1
Journal Page Range
p. 015307-015307.6
ISSN
0021-8979
CODEN
JAPIAU

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