Published May 2014 | Version v1
Journal article

Plasma devices for focusing extreme light pulses

  • 1. LULI, Ecole Polytechnique, 91128 Palaiseau (France)
  • 2. Department of Applied Physics, Chalmers University of Technology, 41296 Gothenberg (Sweden)
  • 3. University of Nizhny Novgorod, 603950 Nizhny Novgorod (Russian Federation)
  • 4. Institute of Applied Physics, Russian Academy of Sciences, 603950 Nizhny Novgorod (Russian Federation)
  • 5. European XFEL GmbH, Albert-Einstein-Ring 19, 22761 Hamburg (Germany)
  • 6. University of St Andrews, High Energy Laser Materials Laboratory, Unit 4, NTC, North Haugh, St Andrews, KY16 9SR (United Kingdom)
  • 7. Laboratoire Interactions, Dynamiques et Lasers, CEA, DSM/IRAMIS, CEN Saclay, 91191 Gif-sur-Yvette (France)
  • 8. State Key Laboratory of Nuclear Physics and Technology, Center of Applied Physics and Technology, Peking University, Beijing 100871 (China)

Description

Since the inception of the laser, there has been a constant push toward increasing the laser peak intensity, as this has lead to opening the exploration of new territories, and the production of compact sources of particles and radiation with unprecedented characteristics. However, increasing the peak laser intensity is usually performed by enhancing the produced laser properties, either by lowering its duration or increasing its energy, which involves a great level of complexity for the laser chain, or comes at great cost. Focusing tightly is another possibility to increase the laser intensity, but this comes at the risk of damaging the optics with target debris, as it requires their placement in close proximity to the interaction region. Plasma devices are an attractive, compact alternative to tightly focus extreme light pulses and further increase the final laser intensity. (authors)

Availability note (English)

Available from doi: http://dx.doi.org/10.1140/epjst/e2014-02169-y

Additional details

Identifiers

Publishing Information

Journal Title
European Physical Journal. Special Topics
Journal Volume
223
Journal Issue
no.6
Journal Page Range
p. 1169-1173
ISSN
1951-6355

INIS

Country of Publication
France
Country of Input or Organization
France
INIS RN
45086558
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY; S43: PARTICLE ACCELERATORS;
Descriptors DEI
BEAM OPTICS; EXAWATT POWER RANGE; FOCUSING; LASER RADIATION; LASERS; OPTICAL SYSTEMS
Descriptors DEC
ELECTROMAGNETIC RADIATION; POWER RANGE; RADIATIONS

Optional Information

Notes
15 refs.