Published 2000
| Version v1
Miscellaneous
Molecular dynamics simulations on surface properties of silicon dioxide melts
Description
In the present thesis the surface properties of a silicon dioxide melt were studied. As first systems drops (i.e. sytems without periodic boundary conditions) of N=432, 1536, as well as 4608 atoms were considered. The second analyzed geometry corresponds to that of a thin film, i. e. periodic boundary conditions in x- and y-direction were present, while in z-direction one had a free surface. In this case a system of N=1152 atoms was considered. As model potential the two-body potential proposed by Beest, Kramer, and van Santen was applied. For both geometries five temperatures were considered, which lied in the range of 3000 K<T<4700 K for the drops and 3400 K<T<5200 K for the thin film
Availability note (English)
Available from: http://ArchiMeD.uni-mainz.de/pub/2000/0052/diss.pdfAdditional details
Additional titles
- Original title (German)
- Molekulardynamik-Simulationen zu Oberflaecheneigenschaften von Siliziumdioxid-Schmelzen
Identifiers
Publishing Information
- Imprint Pagination
- 135 p.
INIS
- Country of Publication
- Germany
- Country of Input or Organization
- Germany
- INIS RN
- 33013385
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Thesis, Non-conventional Literature
- Descriptors DEI
- BOUNDARY CONDITIONS; CHEMICAL BONDS; CORRELATION FUNCTIONS; DROPLETS; INTERMOLECULAR FORCES; LIQUIDS; MOLECULAR CLUSTERS; MOLECULAR DYNAMICS METHOD; SILICON OXIDES; STRUCTURE FACTORS; SURFACE ENERGY; TEMPERATURE RANGE 1000-4000 K; TEMPERATURE RANGE OVER 4000 K; THIN FILMS
- Descriptors DEC
- CALCULATION METHODS; CHALCOGENIDES; ENERGY; FILMS; FLUIDS; FREE ENERGY; FUNCTIONS; OXIDES; OXYGEN COMPOUNDS; PARTICLES; PHYSICAL PROPERTIES; SILICON COMPOUNDS; SURFACE PROPERTIES; TEMPERATURE RANGE; THERMODYNAMIC PROPERTIES