Published September 30, 2008 | Version v1
Journal article

Pd adsorption on Si(1 1 3) surface: STM and XPS study

  • 1. Nano High-Tech Research Center, Toyota Technological Institute, 2-12-1, Hisakata Tempaku, Nagoya 468-8511 (Japan)

Description

Pd-induced surface structures on Si(1 1 3) have been studied by scanning tunneling microscopy (STM) and X-ray photoelectron spectroscopy (XPS). In the initial process of the Pd adsorption below 0.10 ML, Pd silicide (Pd2Si) clusters are observed to form randomly on the surface. By increasing the Pd coverage to 0.10 ML, the clusters cover the entire surface, and an amorphous layer is formed. After annealing the Si(1 1 3)-Pd surface at 600 deg. C, various types of islands and chain protrusions appears. The agglomeration, coalescence and crystallization of these islands are observed by using high temperature (HT-) STM. It is also found by XPS that the islands correspond to Pd2Si structure. On the basis of these results, evolution of Pd-induced structures at high temperatures is in detail discussed

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2008.02.035

Additional details

Identifiers

DOI
10.1016/j.apsusc.2008.02.035;
PII
S0169-4332(08)00302-4;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
254
Journal Issue
23
Journal Page Range
p. 7797-7802
ISSN
0169-4332
CODEN
ASUSEE

Conference

Title
9. international conference on atomically controlled surfaces, interfaces and nanostructures
Acronym
ASCIN-9
Dates
11-15 Nov 2007
Place
Tokyo (Japan)

Optional Information

Copyright
Copyright (c) 2008 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.