Electron energy probability function in plasma controlled by high-energy run-away electrons
- 1. Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University (Russian Federation)
Description
The electron energy probability function (EEPF) probe measurements in cold plasma controlled by high-energy (0.5–1 keV) run-away electrons generated in an 'open-discharge' configuration are presented in this paper. High plasma stability along with the second harmonic lock-in measurement method provide a sufficiently high accuracy of the EEPF measurements which makes it possible to thoroughly study the features of both cold plasma and the probe method itself. The experiments have been carried out in pure gases: Ar, He, O2 and H2. The run-away electron beam is revealed to produce a lot of cold electrons in each gas and the EEPF is Maxwellian with T e about few tens of meV (which is slightly higher than the gas temperature). It is shown that an EEPF can be correctly measured under these conditions if the modulation amplitude and, accordingly, the energy resolution of the method is less than the electron temperature, T e. At the same time, integration of the measured EEPF always underestimates the electron density, n e, due to the 'depletion effect' for low-energy electrons, regardless of the energy resolution of the measurements. It is demonstrated that the open discharge allows obtaining a sufficiently dense and cold, in fact thermal, plasma, which may be of interest for research and various applications. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1361-6595/ab6073Additional details
Identifiers
Publishing Information
- Journal Title
- Plasma Sources Science and Technology
- Journal Volume
- 29
- Journal Issue
- 2
- Journal Page Range
- [8 p.]
- ISSN
- 0963-0252
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 52058560
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- COLD PLASMA; ELECTRON BEAMS; ELECTRON DENSITY; ELECTRON TEMPERATURE; ENERGY RESOLUTION; EV RANGE 100-1000; MILLI EV RANGE
- Descriptors DEC
- BEAMS; ENERGY RANGE; EV RANGE; LEPTON BEAMS; PARTICLE BEAMS; PLASMA; RESOLUTION