Published February 1, 2020 | Version v1
Journal article

Electron energy probability function in plasma controlled by high-energy run-away electrons

  • 1. Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University (Russian Federation)

Description

The electron energy probability function (EEPF) probe measurements in cold plasma controlled by high-energy (0.5–1 keV) run-away electrons generated in an 'open-discharge' configuration are presented in this paper. High plasma stability along with the second harmonic lock-in measurement method provide a sufficiently high accuracy of the EEPF measurements which makes it possible to thoroughly study the features of both cold plasma and the probe method itself. The experiments have been carried out in pure gases: Ar, He, O2 and H2. The run-away electron beam is revealed to produce a lot of cold electrons in each gas and the EEPF is Maxwellian with T e about few tens of meV (which is slightly higher than the gas temperature). It is shown that an EEPF can be correctly measured under these conditions if the modulation amplitude and, accordingly, the energy resolution of the method is less than the electron temperature, T e. At the same time, integration of the measured EEPF always underestimates the electron density, n e, due to the 'depletion effect' for low-energy electrons, regardless of the energy resolution of the measurements. It is demonstrated that the open discharge allows obtaining a sufficiently dense and cold, in fact thermal, plasma, which may be of interest for research and various applications. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1361-6595/ab6073

Additional details

Identifiers

Publishing Information

Journal Title
Plasma Sources Science and Technology
Journal Volume
29
Journal Issue
2
Journal Page Range
[8 p.]
ISSN
0963-0252

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
52058560
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
COLD PLASMA; ELECTRON BEAMS; ELECTRON DENSITY; ELECTRON TEMPERATURE; ENERGY RESOLUTION; EV RANGE 100-1000; MILLI EV RANGE
Descriptors DEC
BEAMS; ENERGY RANGE; EV RANGE; LEPTON BEAMS; PARTICLE BEAMS; PLASMA; RESOLUTION