Published August 2010 | Version v1
Journal article

Fabrication and characterization of low aberration micrometer-sized electron lenses

  • 1. Institute of Physics, University of Zurich, Winterthurerstrasse 190, 8057 Zurich (Switzerland)

Description

Intrinsic spherical aberrations of electron lenses have been the major resolution limiting factor in electron microscopes for several decades. While effective correctors have recently been implemented, an alternative to correct these aberrations is to circumvent them by scaling down lens dimensions by several orders of magnitude. We have fabricated electrostatic lenses exhibiting one micrometer diameter apertures and evaluated their beam forming properties against predictions from numerical ray tracing simulations. It turns out that it is routinely possible to shape a paraxial low-energy electron beam by such micron-sized lenses. Beam profiles have been measured both at a distant detector as well as in a plane close to the lens. It is shown that the lens can form a parallel beam extending no more than 800 nm from the optical axes at a distance of 200μm beyond the lens exit. We believe that these findings constitute a prerequisite to derive novel tools for high resolution microscopy using low-energy electrons.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.ultramic.2010.04.013

Additional details

Identifiers

DOI
10.1016/j.ultramic.2010.04.013;
PII
S0304-3991(10)00121-X;

Publishing Information

Journal Title
Ultramicroscopy (Amsterdam)
Journal Volume
110
Journal Issue
9
Journal Page Range
p. 1148-1153
ISSN
0304-3991
CODEN
ULTRD6

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
44102941
Subject category
S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
Descriptors DEI
APERTURES; BEAM PROFILES; COMPUTERIZED SIMULATION; ELECTRON BEAMS; ELECTRON MICROSCOPES; ELECTROSTATIC LENSES; FABRICATION; FIELD EMISSION; GEOMETRICAL ABERRATIONS; OPTICS; RESOLUTION
Descriptors DEC
BEAMS; EMISSION; LENSES; LEPTON BEAMS; MICROSCOPES; OPENINGS; PARTICLE BEAMS; SIMULATION

Optional Information

Copyright
Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.